최근 본 자료

추천 연관자료

• The Use of Inductively Coupled CF4 Ar Plasma to Improve the Etch Rate of ZrO2 Thin Films
• The Dry Etching of TiN Thin Films Using Inductively Coupled CF4 Ar Plasma
• Study of Surface Reaction and Gas Phase Chemistries in High Density C4F8 O2 Ar and C4F8 O2 Ar CH2F2 Plasma for Contact Hole Etching
• Enhanced Hydrophilic Property of TiO2 Thin Film Deposited on Glass Etched with O2 Plasma
• Dry Etching Properties of HfAlO3 Thin Film with Addition O2 gas Using a High Density Plasma