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• Etching Characteristics of HfAlO3Thin Films Using an Cl2 BCl3 Ar Inductively Coupled Plasma
• CPTED인식이 범죄두려움에 미치는 영향에 관한 연구
• The Dry Etching Properties of TaN Thin Film Using Inductively Coupled Plasma
• The Use of Inductively Coupled CF4 Ar Plasma to Improve the Etch Rate of ZrO2 Thin Films
• The Dry Etching of TiN Thin Films Using Inductively Coupled CF4 Ar Plasma