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The Dry Etching Properties of ZnO Thin Film in Cl2 BCl3 Ar Plasma

소개글 Author: Woo Jong-Chang, Kim Chang-Il Organization: Woo Jong-Chang; Kim Chang-Il Publish: Transactions on Electrical and Electronic Materials Volume 11, Issue3, p116~119, 25 June 2010
태그
  • Zinc oxide
  • Plasma etch
  • Selectivity
  • Etch rate
  • X-ray photoelectron spectroscopy