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Etching Characteristics of HfAlO3Thin Films Using an Cl2 BCl3 Ar Inductively Coupled Plasma

소개글 Organization: Ha Tae-Kyung; Woo Jong-Chang; Kim Chang-Il Publish: Transactions on Electrical and Electronic Materials Volume 11, Issue4, p166~169, 25 Aug 2010
태그
  • Etch
  • HfAlO3
  • Inductively coupled plasma
  • X-ray photoelectron spectroscopy