Dry Etching of Al2O3Thin Films in O2 BCl3 Ar Inductively Coupled Plasma
소개글Author: Yang Xeng, Woo Jong-Chang, Um Doo-Seung, Kim Chang-Il
Organization: Yang Xeng; Woo Jong-Chang; Um Doo-Seung; Kim Chang-Il
Publish: Transactions on Electrical and Electronic Materials Volume 11, Issue5, p202~205, 25 Oct 2010
