최근 본 자료

추천 연관자료

• Study of Surface Reaction and Gas Phase Chemistries in High Density C4F8 O2 Ar and C4F8 O2 Ar CH2F2 Plasma for Contact Hole Etching
• Enhanced Hydrophilic Property of TiO2 Thin Film Deposited on Glass Etched with O2 Plasma
• The Dry Etching Characteristics of TiO2 Thin Films in N2 CF4 Ar Plasma
• The Use of Inductively Coupled CF4 Ar Plasma to Improve the Etch Rate of ZrO2 Thin Films
• Dry Etching of Al2O3Thin Films in O2 BCl3 Ar Inductively Coupled Plasma