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• Catalytic Decomposition of SF6 by Hydrolysis over γ - Al2O3 Supported Metal Oxide Catalysts
• The Use of Inductively Coupled CF4 Ar Plasma to Improve the Etch Rate of ZrO2 Thin Films
• The Dry Etching of TiN Thin Films Using Inductively Coupled CF4 Ar Plasma
• The Dry Etching Characteristics of TiO2 Thin Films in N2 CF4 Ar Plasma
• Enthalpy Changes of Adsorption of Tetrafluorocarbon (CF4) and Hexafluoroethane (C2F6) on Activated C