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• Preparation of Pt Catalysts Supported on ACF with CNF via Catalytic Growth
• The Use of Inductively Coupled CF4 Ar Plasma to Improve the Etch Rate of ZrO2 Thin Films
• The Dry Etching of TiN Thin Films Using Inductively Coupled CF4 Ar Plasma
• The Dry Etching Characteristics of TiO2 Thin Films in N2 CF4 Ar Plasma
• Verification of CFD analysis methods for predicting the drag force and thrust power of an underwater disk robot